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Ch2FCF3 Gas Flow Rate Effects of SiO2 Plasma Etching Rate on Quartz Crystal Microbalance

Article info plasma etching application/pdf eJournal

oleh Jalu Permana, Antonius Prisma , Djoko HS, Dionysius Joseph , Masruroh, Masruroh

Terbitan	: Natural B, 2016
Institusi	: Universitas Brawijaya
Gedung	:

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Lokasi	Repository	IOS Number
		IOS649.article-324

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