Ch2FCF3 Gas Flow Rate Effects of SiO2 Plasma Etching Rate on Quartz Crystal Microbalance

Main Authors: Jalu Permana, Antonius Prisma, Djoko HS, Dionysius Joseph, Masruroh, Masruroh
Other Authors: Advanced System and Material Technology (ASMAT), Brawijaya University, Department of Mathematics and Natural Science
Format: Article info plasma etching application/pdf eJournal
Bahasa: eng
Terbitan: Natural B , 2016
Subjects:
RIE
QCM
Online Access: http://natural-b.ub.ac.id/index.php/natural-b/article/view/324
http://natural-b.ub.ac.id/index.php/natural-b/article/view/324/pdf

Internet

http://natural-b.ub.ac.id/index.php/natural-b/article/view/324
http://natural-b.ub.ac.id/index.php/natural-b/article/view/324/pdf

Lokasi

Koleksi Natural B
Gedung Perpustakaan Universitas Brawijaya
Institusi Universitas Brawijaya
Kota MALANG
Provinsi JAWA TIMUR
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