Area selective ALD of cobalt as mediated by thermally induced dehydrocoupled SAMs

Main Authors: Brick, Chad, Arkles, Barry, Goff, Jonathan, Kaloyeros, Alain
Format: Proceeding poster eJournal
Bahasa: eng
Terbitan: , 2019
Subjects:
Online Access: https://zenodo.org/record/4147563
ctrlnum 4147563
fullrecord <?xml version="1.0"?> <dc schemaLocation="http://www.openarchives.org/OAI/2.0/oai_dc/ http://www.openarchives.org/OAI/2.0/oai_dc.xsd"><creator>Brick, Chad</creator><creator>Arkles, Barry</creator><creator>Goff, Jonathan</creator><creator>Kaloyeros, Alain</creator><date>2019-07-26</date><description>Organic trihydridosilanes provide an elegant route for generating self-assembled monolayers (SAM)s by vapor phase transport on a variety of substrates. Under mild conditions, these precursors can be made to interact with a variety of clean metal and hydrogenated metalloid surfaces such as Ti, Cu, and Si to form near-zero-thickness SAMs. These SAMs can be customized with specific functionality to activate or deactivate subsequent Co deposition on the underlying substrate, leading to area specific Co deposition.</description><identifier>https://zenodo.org/record/4147563</identifier><identifier>10.5281/zenodo.4147563</identifier><identifier>oai:zenodo.org:4147563</identifier><language>eng</language><relation>doi:10.5281/zenodo.4147562</relation><rights>info:eu-repo/semantics/openAccess</rights><rights>https://creativecommons.org/licenses/by/4.0/legalcode</rights><subject>Cobalt</subject><subject>Area Specific Deposition</subject><title>Area selective ALD of cobalt as mediated by thermally induced dehydrocoupled SAMs</title><type>Journal:Proceeding</type><type>Other:poster</type><recordID>4147563</recordID></dc>
language eng
format Journal:Proceeding
Journal
Other:poster
Other
Journal:eJournal
author Brick, Chad
Arkles, Barry
Goff, Jonathan
Kaloyeros, Alain
title Area selective ALD of cobalt as mediated by thermally induced dehydrocoupled SAMs
publishDate 2019
topic Cobalt
Area Specific Deposition
url https://zenodo.org/record/4147563
contents Organic trihydridosilanes provide an elegant route for generating self-assembled monolayers (SAM)s by vapor phase transport on a variety of substrates. Under mild conditions, these precursors can be made to interact with a variety of clean metal and hydrogenated metalloid surfaces such as Ti, Cu, and Si to form near-zero-thickness SAMs. These SAMs can be customized with specific functionality to activate or deactivate subsequent Co deposition on the underlying substrate, leading to area specific Co deposition.
id IOS17403.4147563
institution Universitas PGRI Palembang
institution_id 189
institution_type library:university
library
library Perpustakaan Universitas PGRI Palembang
library_id 587
collection Marga Life in South Sumatra in the Past: Puyang Concept Sacrificed and Demythosized
repository_id 17403
city KOTA PALEMBANG
province SUMATERA SELATAN
repoId IOS17403
first_indexed 2022-07-26T01:50:18Z
last_indexed 2022-07-26T01:50:18Z
recordtype dc
merged_child_boolean 1
_version_ 1739403286344105984
score 17.60897