Area selective ALD of cobalt as mediated by thermally induced dehydrocoupled SAMs
| Main Authors: | Brick, Chad, Arkles, Barry, Goff, Jonathan, Kaloyeros, Alain |
|---|---|
| Format: | Proceeding poster eJournal |
| Bahasa: | eng |
| Terbitan: |
, 2019
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| Subjects: | |
| Online Access: |
https://zenodo.org/record/4147563 |
Daftar Isi:
- Organic trihydridosilanes provide an elegant route for generating self-assembled monolayers (SAM)s by vapor phase transport on a variety of substrates. Under mild conditions, these precursors can be made to interact with a variety of clean metal and hydrogenated metalloid surfaces such as Ti, Cu, and Si to form near-zero-thickness SAMs. These SAMs can be customized with specific functionality to activate or deactivate subsequent Co deposition on the underlying substrate, leading to area specific Co deposition.